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Most microfluidics use "standard" lithography techniques for patterning hard substrates such as glass or silicon. This would entail spinning photoresist, then exposing and wet etching in KOH (silicon) or HF (glass) or dry etching in a reactive ion etcher or deep reactive ion etcher. Soft lithography is also common in microfluidics where a mask is created using a hard material such as patterned SU-8 or etched glass. A polymer such as PDMS is then cast on the mold to create the microfluidic features.

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Q: What lithography technique used in microfluidics?
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